The Electrical Properties of Liquid-Phase Deposited SiOF Films with Annealing Treatment
碩士 === 國立中山大學 === 電機工程學系研究所 === 91 === With increasing integration density of very large scale integrated (VLSI) devices, multilevel metallization technology is becoming more important than it used to be. In advanced logic devices, the interlayer dielectrics have increased to four or five layers. Si...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2003
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/11670271403397537683 |