Study of bottom antireflective coating layers for deep sub-micron generation lithography and selective growth of nanoparticles
碩士 === 國立清華大學 === 原子科學系 === 91 === In this thesis, our study contains two parts. First, low dielectric constant silicon carbide films were deposited by inductively coupled plasma to make a bottom antireflective coating layers for vacuum and deep ultraviolet lithographies. We can reduce th...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2003
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| Online Access: | http://ndltd.ncl.edu.tw/handle/55035768881290313432 |