Electrical Analysis Simulation and Fabrication of RF MEMS Switches
碩士 === 國立清華大學 === 電子工程研究所 === 91 === In this study, we investigated the electrical analysis simulation and fabrication of RF MEMS(Micro Electromechanical System) switches. Except that the theoretical S-parameter has been derived, we also used Ansoft HFSS to simulate and analyze these devi...
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ndltd-TW-091NTHU04280472016-06-22T04:26:24Z http://ndltd.ncl.edu.tw/handle/64832224619924326648 Electrical Analysis Simulation and Fabrication of RF MEMS Switches 射頻微機電開關電性分析模擬與實做 Ze-Yuan Jan 詹智元 碩士 國立清華大學 電子工程研究所 91 In this study, we investigated the electrical analysis simulation and fabrication of RF MEMS(Micro Electromechanical System) switches. Except that the theoretical S-parameter has been derived, we also used Ansoft HFSS to simulate and analyze these devices. Besides, parasitic passive devices such as inductance of cantilever or capacitance of actuated plate were discussed how they affect the switches isolation. In this thesis, a process was designed to fabricate these switches, it was easy to realize with four masks. The whole structure include coplanar waveguide (CPW) and actuated membrane was made with Au(using photoresist as sacrificial layer). In order to prevent the substrate loss, we choose high resistance wafer as substrate. Before running the process, the whole procedure was simulated by CoventorWare CAD tool to make sure that the mask had no error. This simulation results could help us to preview the device property and structure. Chen-Shin Lien 連振炘 2003 學位論文 ; thesis 69 zh-TW |
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碩士 === 國立清華大學 === 電子工程研究所 === 91 === In this study, we investigated the electrical analysis simulation and fabrication of RF MEMS(Micro Electromechanical System) switches. Except that the theoretical S-parameter has been derived, we also used Ansoft HFSS to simulate and analyze these devices. Besides, parasitic passive devices such as inductance of cantilever or capacitance of actuated plate were discussed how they affect the switches isolation.
In this thesis, a process was designed to fabricate these switches, it was easy to realize with four masks. The whole structure include coplanar waveguide (CPW) and actuated membrane was made with Au(using photoresist as sacrificial layer). In order to prevent the substrate loss, we choose high resistance wafer as substrate. Before running the process, the whole procedure was simulated by CoventorWare CAD tool to make sure that the mask had no error. This simulation results could help us to preview the device property and structure.
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Chen-Shin Lien |
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Chen-Shin Lien Ze-Yuan Jan 詹智元 |
author |
Ze-Yuan Jan 詹智元 |
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Ze-Yuan Jan 詹智元 Electrical Analysis Simulation and Fabrication of RF MEMS Switches |
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Ze-Yuan Jan |
title |
Electrical Analysis Simulation and Fabrication of RF MEMS Switches |
title_short |
Electrical Analysis Simulation and Fabrication of RF MEMS Switches |
title_full |
Electrical Analysis Simulation and Fabrication of RF MEMS Switches |
title_fullStr |
Electrical Analysis Simulation and Fabrication of RF MEMS Switches |
title_full_unstemmed |
Electrical Analysis Simulation and Fabrication of RF MEMS Switches |
title_sort |
electrical analysis simulation and fabrication of rf mems switches |
publishDate |
2003 |
url |
http://ndltd.ncl.edu.tw/handle/64832224619924326648 |
work_keys_str_mv |
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