Effect of substrate bias on the structure and properties of nanocrystalline ZrN thin film deposited by

碩士 === 國立清華大學 === 工程與系統科學系 === 91 === Nanocrystalline ZrN films were deposited on Si substrates using an unbalanced magnetron (UBM) sputtering system. The effect of bias on the microstructure and properties of zirconium nitride (ZrN) film was investigated. A negative bias voltage ranging from —20 V...

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Bibliographic Details
Main Authors: Yu-Wei Lin, 林郁洧
Other Authors: 喻冀平
Format: Others
Language:en_US
Published: 2003
Online Access:http://ndltd.ncl.edu.tw/handle/88529911553609915837