Advanced Process Control on Inductively Coupled Plasmas Etch Processing for ULSI Circuit Manufacturing
博士 === 國立清華大學 === 工程與系統科學系 === 91 === The advanced semiconductor fabrication requires a much tighter process monitoring and control to improve production yield and reliability. Among the several hundreds of processing steps of modern ultralarge scale integrated circuits (ULSI) fabrication, plasma b...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2003
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| Online Access: | http://ndltd.ncl.edu.tw/handle/72264245642235263111 |