Advanced Process Control on Inductively Coupled Plasmas Etch Processing for ULSI Circuit Manufacturing
博士 === 國立清華大學 === 工程與系統科學系 === 91 === The advanced semiconductor fabrication requires a much tighter process monitoring and control to improve production yield and reliability. Among the several hundreds of processing steps of modern ultralarge scale integrated circuits (ULSI) fabrication, plasma b...
Main Authors: | Chenh-Hung Chang, 張正宏 |
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Other Authors: | Chaung Lin |
Format: | Others |
Language: | zh-TW |
Published: |
2003
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Online Access: | http://ndltd.ncl.edu.tw/handle/72264245642235263111 |
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