Effect of Film Thickness on the Structure and Properties of Nanocrystalline ZrN Thin Film Deposited by Ion Plating

碩士 === 國立清華大學 === 工程與系統科學系 === 91 === Nanocrystalline ZrN thin films were successfully deposited on Si (100) and AISI 316 stainless steel substrates using hollow cathode discharge ion plating (HCD-IP) system. The objective of this study was to investigate the effect of film thickness on the composit...

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Bibliographic Details
Main Authors: Yang Hao-Chung, 楊濠仲
Other Authors: 黃嘉宏
Format: Others
Language:en_US
Published: 2003
Online Access:http://ndltd.ncl.edu.tw/handle/94264453007031399483