Microfabrication of Capacitive Ultrasonic Transducers
碩士 === 國立海洋大學 === 系統工程暨造船學系 === 91 === The main focus of the study is to implement the design and microfabrication for phased-array ultrasonic transducers using MEMS technology. The capacitive ultrasonic transducers (cMUTs) combining CMOS process technology is the potential renovation in high tech a...
Main Author: | |
---|---|
Other Authors: | |
Format: | Others |
Language: | zh-TW |
Published: |
2003
|
Online Access: | http://ndltd.ncl.edu.tw/handle/32303273283066841401 |
id |
ndltd-TW-091NTOU0345017 |
---|---|
record_format |
oai_dc |
spelling |
ndltd-TW-091NTOU03450172016-06-22T04:26:45Z http://ndltd.ncl.edu.tw/handle/32303273283066841401 Microfabrication of Capacitive Ultrasonic Transducers 微電容式超音波感知器之研製 黃炫貴 碩士 國立海洋大學 系統工程暨造船學系 91 The main focus of the study is to implement the design and microfabrication for phased-array ultrasonic transducers using MEMS technology. The capacitive ultrasonic transducers (cMUTs) combining CMOS process technology is the potential renovation in high tech area. The transducer is designed by a low-stress silicon membrane in which the cavity is formed by a sacrificial layer etching. And it operates by a DC voltage and the AC exciting signal in the range of 1~ 3 MHz. Theoretical analysis and computer simulations of capacitive ultrasonic transducer array are reported. Surface-micromachining techniques such like LPCVD, dry etching, wet etching , and lithography are applied in this study. The cavity of ultrasonic transducer is vacuum-sealed using LPCVD process for immersion application. Several important issues regarding fabrication process have been raised and discussed in this study. 陳柏台 2003 學位論文 ; thesis 51 zh-TW |
collection |
NDLTD |
language |
zh-TW |
format |
Others
|
sources |
NDLTD |
description |
碩士 === 國立海洋大學 === 系統工程暨造船學系 === 91 === The main focus of the study is to implement the design and microfabrication for phased-array ultrasonic transducers using MEMS technology. The capacitive ultrasonic transducers (cMUTs) combining CMOS process technology is the potential renovation in high tech area. The transducer is designed by a low-stress silicon membrane in which the cavity is formed by a sacrificial layer etching. And it operates by a DC voltage and the AC exciting signal in the range of 1~ 3 MHz. Theoretical analysis and computer simulations of capacitive ultrasonic transducer array are reported. Surface-micromachining techniques such like LPCVD, dry etching, wet etching , and lithography are applied in this study. The cavity of ultrasonic transducer is vacuum-sealed using LPCVD process for immersion application. Several important issues regarding fabrication process have been raised and discussed in this study.
|
author2 |
陳柏台 |
author_facet |
陳柏台 黃炫貴 |
author |
黃炫貴 |
spellingShingle |
黃炫貴 Microfabrication of Capacitive Ultrasonic Transducers |
author_sort |
黃炫貴 |
title |
Microfabrication of Capacitive Ultrasonic Transducers |
title_short |
Microfabrication of Capacitive Ultrasonic Transducers |
title_full |
Microfabrication of Capacitive Ultrasonic Transducers |
title_fullStr |
Microfabrication of Capacitive Ultrasonic Transducers |
title_full_unstemmed |
Microfabrication of Capacitive Ultrasonic Transducers |
title_sort |
microfabrication of capacitive ultrasonic transducers |
publishDate |
2003 |
url |
http://ndltd.ncl.edu.tw/handle/32303273283066841401 |
work_keys_str_mv |
AT huángxuànguì microfabricationofcapacitiveultrasonictransducers AT huángxuànguì wēidiànróngshìchāoyīnbōgǎnzhīqìzhīyánzhì |
_version_ |
1718320321280344064 |