The Wet Etching and Reaction Mechanism of Al/Nd Thin Film in Phosphoric Acid Solutions
碩士 === 國立臺灣大學 === 化學工程學研究所 === 91 === This thesis focuses on the survey of etching (Al 98wt % / Nd 2wt %) alloy. Etching solution includes H3PO4, CH3COOH, HNO3 and deionized water. By changing concentration, stir condition and etching temperature, we measure the etching rate and analyze the surface...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2003
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| Online Access: | http://ndltd.ncl.edu.tw/handle/43871966969124108927 |