Gas-Phase Combustion Synthesis of Nano-particles of Silicon Compounds with HMDSA and HMDSO in the Premixed Propane Flame
博士 === 國立臺灣大學 === 機械工程學研究所 === 91 === The Chemical vapor deposition (CVD) is one of the general technologies used in semiconductor industries to make SiO2 and SiC with the using of expansive and poisonous chemicals. HMDSA (C6H19NSi2) and HMDSO (C6H18OSi2) may be chosen as a substitute to...
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| Format: | Others |
| Language: | zh-TW |
| Online Access: | http://ndltd.ncl.edu.tw/handle/21789832343106283039 |