快速熱處理爐中晶圓表面溫度與沉積均勻性之數值分析
碩士 === 國立臺灣大學 === 機械工程學研究所 === 91 === RTCVD is a widely used process in semiconductor industry. This study using CFD-RC-based computer simulations as a virtual reactor was proposed for cost-effective RTCVD reactor design. The virtual reactor was developed by combining the chemical reactor...
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| Format: | Others |
| Language: | zh-TW |
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2003
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| Online Access: | http://ndltd.ncl.edu.tw/handle/75674565165800238185 |