The Study of Diffusion Barrier (Ta,Ti)Nx Thin Films
碩士 === 國立臺灣科技大學 === 材料科技研究所 === 91 === Abstract This study is to evaluate the feasibility and application of (Ta,Ti)NX thin films as diffusion barriers for Cu/Si multilayered systems. The (Ta,Ti)NX films were deposited by radio frequency reactive sputtering from a TaTi target(...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2003
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| Online Access: | http://ndltd.ncl.edu.tw/handle/13636596915107457171 |