Growth of Ta-B-N Films by RF Sputtering and It''s Application on Cu Metallization of IC Processing
博士 === 國立臺灣科技大學 === 化學工程系 === 91 === Tantalum boride (TaBx) and Tantalum boron nitride (Ta-B-N) films were deposited on silicon substrates by radio frequency (rf) magnetron sputtering of a TaB2 alloy target. The tantalum boride films were sputtered in an Ar plasma and the Ta-B-N films were deposited...
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2003
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| Online Access: | http://ndltd.ncl.edu.tw/handle/94877303833362850601 |