A Study of O2 Plasma Treatment on RF Sputtered Barium Strontium Titanate Thin Films
碩士 === 國立雲林科技大學 === 電子與資訊工程研究所碩士班 === 91 === The semiconductor fabricating technologies will be promoted to nanometer scale, such as Gbit-scaled DRAMs, in the near future. The high-k thin films will be applied as dielectrics of MIM capacitors. We have studies of BaSrTiO3 for MIM structures. In this...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2003
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/40710447156661359193 |