Study on Process Integration of Low Dielectric Constant Materials
碩士 === 國立雲林科技大學 === 電子與資訊工程研究所碩士班 === 91 === As the devices scale down, performance of devices is dominated by propagation delay between metal interconnections. In order to improve this issue, in this thesis, a low dielectric constant material is used to reduce the capacitance between metal intercon...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2003
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| Online Access: | http://ndltd.ncl.edu.tw/handle/45558819873772008615 |