Study on Nanocomposite Resist for the Fabrication of Nano-device
碩士 === 大葉大學 === 電機工程學系碩士班 === 92 === Lithography process is important in making technology of semiconductor and integrated circuit（IC）. In early days, the exposure(G-line , I-line , DUV , EUV and VUV ) of the exposure system, mask technology (PSM , OAI and OPC ) and photo resist (BL and C...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/75282602640192847737 |