Study on the Processing of Low Temperature Poly-Si Thin Film
碩士 === 國立成功大學 === 工程科學系碩博士班 === 92 === At present, the Laser annealing method is the most general way to fabricate the poly-Si film of low temperature for LCD industry. In this study, the working pieces primarily include a-Si film and glass substrate. The KrF excimer laser is used to irradiate the...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/44zj8t |