Fabrication and characterization of nanocrystalline ZrO2 gate oxide
碩士 === 國立成功大學 === 材料科學及工程學系碩博士班 === 92 === ZrO2 thin films are deposited by reactive magnetron sputtering as application for gate oxide, and the effects of various processing methods upon the interfacial layer formed when ZrO2 deposited on Si is investigated. In the first section of the experiment...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/03782914008335884242 |