Design of Two-Dimensional Precision Embossing Platform with Magnetic Actuator

• Main Authors: You-Ru Lee, 李又儒
• Other Authors: Wen-Bin Young
• Format: Others
• Language: zh-TW
• Published: 2004
• Online Access: http://ndltd.ncl.edu.tw/handle/93312756931073777599

碩士 === 國立成功大學 === 航空太空工程學系碩博士班 === 92 === 　　With the progress of MEMS technology, micro and nano fabrication technology of polymer have developed many applications in electro- optical science and biochemistry area. After combined with LIGA process, the nano imprint technology was developed to fabricate nano structures. This process is used to replicate nano structure, and becomes a very important key technology. During the nano imprint process, the most important factors are those as printing pressure, printing temperature, printing time, and so on. Besides, the imprinting machine’s precision and parallelism also affect the quality of finished products. In this study, we use magnetic actuators to drive the embossing platform and the laser displacement meter with feedback control to reduce the position error, so as to increase the parallelism between molds. By the realization of the platform, we expect to increase the quality of micro structure and decrease the surface roughness in imprinting process. A simplified platform made of a cantilever beam with a tip mass and electromagnet was first studied. Based on experimental results, we find that the system can rapidly response and reach submicro position accuracy. Based on the former concept, an embossing platform with large traveling range and precision position was designed.