Fabrication and Characterization of Strain Silicon Thin Films on SiGeC and SiCN Substrates by RTCVD
碩士 === 國立成功大學 === 微電子工程研究所碩博士班 === 92 === This thesis reports the fabrication and characterization of strain silicon on silicon germanium carbon (SiGeC) and silicon carbon nitride (SiCN) films that have been fabricated by rapid-thermal chemical vapor deposition (RTCVD) system on silicon substrates...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/68432756954629458852 |