Monte Carlo Modeling for Effective Emissivity in RTP Furnace
碩士 === 國立成功大學 === 機械工程學系碩博士班 === 92 === The purpose of this research is to examine the effective emissivity of a 300mm wafer in rapid thermal processing (RTP). The heat transfer in the RTP furnace chamber under development at CSIST is considered. This study adopts the Monte Carlo Method (MCM) to c...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2004
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/08342704599893874705 |