Comparison of Anisotropic Etching with KOH and TMAH for Silicon Nanostructures Fabrication
碩士 === 國立暨南國際大學 === 電機工程學系 === 92 === A lot of nanostructures and nanodevices have been reported by combination of scanning probe lithography and anisotropic wet etching techniques in the recent years. Anisotropic wet etching became one of the key technologies for nanofabrication. The pur...
Main Authors: | Wei-Lun Hung, 洪緯綸 |
---|---|
Other Authors: | Jeng-Tzong Sheu |
Format: | Others |
Language: | zh-TW |
Published: |
2004
|
Online Access: | http://ndltd.ncl.edu.tw/handle/26751462539944533403 |
Similar Items
-
Study on TMAH Anisotropic Etching and the Fabrication Process of Piezoelectric Thin Film
by: Peng, Hsin-Ya, et al.
Published: (2000) -
Study and Application of TMAH Anisotropic Wet Etching
by: Chia-Ming Hsieh, et al.
Published: (2000) -
Study on the Anisotropic Etching of Boron Diffused <111> Single Crystalline Silicon in Dual Doped TMAH Solutions
by: Teh-Zhi Huang, et al.
Published: (2010) -
Fabrication of Submicron Beams with Galvanic Etch Stop for Si in TMAH
by: Yuelin Wang, et al.
Published: (2009-04-01) -
Two-Layer Microstructures Fabricated by One-Step Anisotropic Wet Etching of Si in KOH Solution
by: Han Lu, et al.
Published: (2016-01-01)