microwave plasma chemical vapor deposition of diamond on poly-silicon substrates
碩士 === 國立交通大學 === 材料科學與工程系所 === 92 === In this work, diamond was deposited on mirror-polished poly-silicon substrates by microwave plasma chemical vapor deposition using gas mixtures of methane and hydrogen. The poly-silicon substrate consists of micrometer-sized grains of characteristic morphologie...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2004
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/z39k7z |