The Effects of Various Pre-treatments on the Electrical Properties of HfO2 Gate Dielectrics

碩士 === 國立交通大學 === 電子工程系所 === 92 ===

Bibliographic Details
Main Authors: Po-Ching Lin, 林柏青
Other Authors: Tiao-Yuan Huang
Format: Others
Language:zh-TW
Published: 2004
Online Access:http://ndltd.ncl.edu.tw/handle/dxa55n