Study of NiTiO/CoTiO Interpoly Dielectrics with NH3/N2O Plasma Treatment
碩士 === 國立交通大學 === 電子工程系所 === 92 === Cobalt-titanium oxide and nickel-titanium oxide was formed by furnace oxidation. It can be used for the interpoly dielectric for nonvolatile memory, storage capacitor dielectric for DRAM and gate oxide for MOSFET applications. When it was used for the interpoly di...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/x5ed2s |