Study on Nanocrystal Nonvolatile Memory Devices

碩士 === 國立交通大學 === 電子工程系所 === 92 === In a conventional nonvolatile memory, charge is stored in a polysilicon floating gate (FG) surrounded by dielectrics. The scaling limitation stems from the requirement of very thin tunnel oxide layer. For FG, once the tunnel oxide develops a leaky path under repea...

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Bibliographic Details
Main Authors: Sheng Hung Lin, 林泩宏
Other Authors: Simon M. Sze
Format: Others
Language:en_US
Published: 2004
Online Access:http://ndltd.ncl.edu.tw/handle/x8n365