Barrier Properties of TaSixNy Thin Films against Cu Diffusion
碩士 === 國立交通大學 === 電子工程系所 === 92 === This thesis studies the barrier property of 10-nm-thick TaSix-based TaSixNy layers sputter deposited from a TaSi2 target in various N2/Ar mixing gases, using electrical measurement on Cu/TaSixNy/p+-n junction diodes as well as various techniques of material analys...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2004
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/4u8nf3 |