Improvement in Temperature Uniformity of a Lamp-Heated Silicon Wafer throught Wafer Rotation and/or Translation
碩士 === 國立交通大學 === 機械工程系所 === 92 === Temperature measurement on the surface of an eight-inch a silicon wafer is conducted in the present study to explore the temperature uniformity of a lamp heated wafer during a model rapid thermal processing. The possible improvement of the wafer temperature unifor...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/432f3g |