The growth and characterization of Si-doped GaN thin film andnanodots

• Main Authors: Jian-Feng Wu, 吳建鋒
• Other Authors: none
• Format: Others
• Language: zh-TW
• Published: 2003
• Online Access: http://ndltd.ncl.edu.tw/handle/63783145470886722607

碩士 === 國立中山大學 === 物理學系研究所 === 92 === In this thesis, we study a series of Si-doped GaN thin films and nanodots. These samples are growth on c-face sapphire substrate by Molecular Beam Epitaxy. In Si-doped GaN thin film growth, different Si cell temperature are used to control the dopant concentration. Van der Pauw hall measurement is used to measure the carrier concentrations and the mobilities. As increase Si cell temperature, the carrier concentration and the mobility increase. The maximum carrier concentration is 8 × 1019 cm-3, and the maximum mobility is 194 cm2/V-s. As increasing the Si dopant concentration, the near band edge photoluminescence emission peak intensity increases, but the full width at half maximum broaden from 47 meV to 117 meV. In Raman measurement result, with the increasing of Si dopant concentration, the E2(high) mode shifts from 569.4 cm-1 to 567.9 cm-1. The A1(LO) mode disappears gradually. In the nanodot growth, the AFM images show that the nanodots size become large as increasing the growth time. The nanodots size is change from 1.2 nm to 5.6 nm high and 40 nm to 110 nm wide, but the density of the nanodots decreases from 1.9 × 1010 cm-2 to 6 × 109 cm-2 at 15 sec and 90 sec growth, respectively. According to the AFM image of the nanodots surface morphology, the nanodots growth mode should be the Stranski-Krastanow mode.