A Study of The Fixed Abrasives Pad is worn and conditioned
碩士 === 國立清華大學 === 動力機械工程學系 === 92 === Chemical mechanical polishing (CMP) is the most effective method to achieve global planarization in semiconductor industry. The polishing pad is one of the primary consumables in CMP. Extending the life of polishing pad can reduce cost of consumables and improve...
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ndltd-TW-092NTHU53110752015-10-13T13:08:03Z http://ndltd.ncl.edu.tw/handle/48067216195943006091 A Study of The Fixed Abrasives Pad is worn and conditioned 固定磨粒拋光墊磨耗與修整之研究 Psung-Pen Hsu 徐宗本 碩士 國立清華大學 動力機械工程學系 92 Chemical mechanical polishing (CMP) is the most effective method to achieve global planarization in semiconductor industry. The polishing pad is one of the primary consumables in CMP. Extending the life of polishing pad can reduce cost of consumables and improve process stability. The purpose of this thesis is to study the method of dressing a fixed abrasive pad to prolong its lif e and proving the method workable. The fixed abrasive pad is dressed by a round slice that is coated diamond-like carbon about 0.3µm. We have found that using the nano-diamond dresser can dress the fixed abrasive pad. After conditioning the roughness of abrasive layer in the fixed abrasives pad resume. Pei-Lum Tso 左培倫 2004 學位論文 ; thesis 78 zh-TW |
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碩士 === 國立清華大學 === 動力機械工程學系 === 92 === Chemical mechanical polishing (CMP) is the most effective method to achieve global planarization in semiconductor industry. The polishing pad is one of the primary consumables in CMP. Extending the life of polishing pad can reduce cost of consumables and improve process stability.
The purpose of this thesis is to study the method of dressing a fixed abrasive pad to prolong its lif e and proving the method workable. The fixed abrasive pad is dressed by a round slice that is coated diamond-like carbon about 0.3µm. We have found that using the nano-diamond dresser can dress the fixed abrasive pad. After conditioning the roughness of abrasive layer in the fixed abrasives pad resume.
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author2 |
Pei-Lum Tso |
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Pei-Lum Tso Psung-Pen Hsu 徐宗本 |
author |
Psung-Pen Hsu 徐宗本 |
spellingShingle |
Psung-Pen Hsu 徐宗本 A Study of The Fixed Abrasives Pad is worn and conditioned |
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Psung-Pen Hsu |
title |
A Study of The Fixed Abrasives Pad is worn and conditioned |
title_short |
A Study of The Fixed Abrasives Pad is worn and conditioned |
title_full |
A Study of The Fixed Abrasives Pad is worn and conditioned |
title_fullStr |
A Study of The Fixed Abrasives Pad is worn and conditioned |
title_full_unstemmed |
A Study of The Fixed Abrasives Pad is worn and conditioned |
title_sort |
study of the fixed abrasives pad is worn and conditioned |
publishDate |
2004 |
url |
http://ndltd.ncl.edu.tw/handle/48067216195943006091 |
work_keys_str_mv |
AT psungpenhsu astudyofthefixedabrasivespadiswornandconditioned AT xúzōngběn astudyofthefixedabrasivespadiswornandconditioned AT psungpenhsu gùdìngmólìpāoguāngdiànmóhàoyǔxiūzhěngzhīyánjiū AT xúzōngběn gùdìngmólìpāoguāngdiànmóhàoyǔxiūzhěngzhīyánjiū AT psungpenhsu studyofthefixedabrasivespadiswornandconditioned AT xúzōngběn studyofthefixedabrasivespadiswornandconditioned |
_version_ |
1717732045738737664 |