Space and Time Resolved Plasma Emission Spectroscopy of Inductively Coupled Chlorine Plasma During Etching

碩士 === 國立清華大學 === 工程與系統科學系 === 92 ===

Bibliographic Details
Main Authors: Huang, Pin-Hsun, 黃品勳
Other Authors: 林滄浪
Format: Others
Language:zh-TW
Published: 2004
Online Access:http://ndltd.ncl.edu.tw/handle/k9cf7c