Fabrication of Phase Masks by Immersion Interference Lithography and Study of Bottom Antireflective Coating Layers for Optical Lithography
博士 === 國立臺灣大學 === 光電工程學研究所 === 92 === In this thesis, our study contains three parts. The first part is the study of utilizing hexamethyldisiloxane (HMDSO) film as the bottom antireflective coating (BARC) layer for deep ultraviolet (DUV) and vacuum ultraviolet (VUV) lithographies. We report a novel...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/56259446045176173923 |