High k Gate Insulator
碩士 === 國立臺灣大學 === 電機工程學研究所 === 92 === The various electrical and material properties of dielectrics are even more important along with the progress of our process technology. When thickness of oxide becomes very thin, carriers which can only be accelerated by electric field in inversion are no longe...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/vfdfyj |