Evaluation and Comparision the Effectiveness of the (Ti,Zr)Nx and TiNx Barriers
碩士 === 國立臺灣科技大學 === 材料科技研究所 === 92 === This study is to evaluate the feasibility and application of binary refractory metal nitride, (Ti,Zr)Nx, thin films as diffusion barriers for Cu/Si multilayerd system. (Ti,Zr)Nx thin films were deposited on silicon substrates by RF magnetron sputtering in N2/Ar...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/00002474682860685122 |