Investigation of Electrical Field Effect on Nickel Induced Crystallization of Amorphous Si

碩士 === 南台科技大學 === 電機工程系 === 92 === In this thesis, striped Ni(500Å)/a-Si(1000Å)/glass structure was utilized for the investigation of the electrical field effect on the enhancement of the lateral crystallization of silicon. Ni is used as electrodes to provide the electrical field for the structure a...

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Bibliographic Details
Main Authors: Jun-Kai Chen, 陳俊凱
Other Authors: Ching-Ming Hsu
Format: Others
Language:en_US
Published: 2004
Online Access:http://ndltd.ncl.edu.tw/handle/64539870672412656573