Study on the deposition of titanium containing diamond like carbon films by cathodic arc plasma

碩士 === 國立臺北科技大學 === 製造科技研究所 === 92 === In this study, titanium containing diamond like carbon ( Ti-DLC ) films have been deposited onto two different substrates: Si wafer and SUS420 stainless steel, by cathodic arc plasma deposition ( CAPD ) technique. The effects of deposition...

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Bibliographic Details
Main Authors: Jui-Yu Chiang, 姜瑞宇
Other Authors: Hwang Yen-Fei
Format: Others
Language:zh-TW
Published: 2004
Online Access:http://ndltd.ncl.edu.tw/handle/56872496955706773484