| Summary: | 碩士 === 國立臺北科技大學 === 製造科技研究所 === 92 === In this study, titanium containing diamond like carbon ( Ti-DLC ) films have been deposited onto two different substrates: Si wafer and SUS420 stainless steel, by cathodic arc plasma deposition ( CAPD ) technique.
The effects of deposition parameters on film characteristics were investigated by field emission scanning electron microscope ( FE-SEM ), atomic force microscope ( AFM ), X-ray diffraction ( XRD ), transmission electron microscope ( TEM ), Raman spectroscope, X-ray photoelectron spectroscope ( XPS ), Auger electron spectroscope ( AES ), scratch test, nano-indentation probe system ( NIP ), wear test and corrosion test.
Results demonstrated that the TiC cluster, Ti-DLC films are well-bonded with both substrates. The 900 cm-1 —1800 cm-1 Raman spectrum consists of D band and G band. The XPS result revealed that the ratio of sp3 to sp2 decreases with increasing Ti content. The Ti content and the surface roughness grow up according to the increase of Ti target current. The bias has significant effect on the sp3 content and hardness. The Ti-DLC films show lower friction coefficient and corrosion potential than Ti—free DLC films.
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