Synthesis of amorphous carbon-nitrogen films by RF plasma enhanced chemical vapor deposition
碩士 === 大同大學 === 材料工程學系(所) === 93 === Deposition of amorphous carbon and amorphous carbon-nitrogen films by RF-plasma enhanced chemical vapor deposition was studied. The effects of deposition parameters, including N2/CH4 ratio, total flow rate, working pressure, RF power, deposition time and the self...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/83114420695560086259 |