Shield Insertion Optimization for Crosstalk Faults by Statistical Analysis

碩士 === 元智大學 === 資訊工程學系 === 92 === With the improvement of process technologies, the spacing between interconnects is getting shorter. The influence of cross-coupling capacitance and inductance between adjacent wires becomes serious. The increase of cross-coupling result in crosstalk effec...

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Bibliographic Details
Main Authors: Shih-Cheng Lee, 李世宸
Other Authors: Wang-Dauh Tseng
Format: Others
Language:en_US
Published: 2004
Online Access:http://ndltd.ncl.edu.tw/handle/16277594641462195215