PLS Based dEWMA Controller for MIMO Semiconductor Processes

• Main Authors: Fan Wang, 王凡
• Other Authors: Junghui Chen
• Format: Others
• Language: zh-TW
• Published: 2005
• Online Access: http://ndltd.ncl.edu.tw/handle/frs22q

碩士 === 中原大學 === 化學工程研究所 === 93 === The modification of the PLS(partial least squares) modeling procedure is developed. It permits incorporation of a dEWMA(double exponentially weighted moving average) control algorithm into the standard run-to-run controller design. This makes it possible to extract the strongest relationship between the input and the output variables by using the resulting structure PLS model. It is particularly useful for inherent noise suppression. Also, the non-squared MIMO control system can be decomposed into a multiloop control system by employing precompensators and postcompensators of the PLS model constructed from the input and output loading matrices. Then the conventional dEWMA controller can be separately and directly applied to each SISO control loop. The performance of the proposed method is illustrated through a Chemical-Mechanical Polishing(CMP) process which is a critical semiconductor manufacturing processing step.