Phase Transition of Reactively Sputter-Deposited Tungsten Oxide Thin Films and Related Electrochemical Plating of Metallic Nanoclusters
碩士 === 逢甲大學 === 材料科學所 === 93 === In this study, the thin films of oxygen-contained tungsten (W-O) and semiconductor tungsten trioxide were fabricated by an ultra-high-vacuum reactive magnetron sputtering at a constant partial pressure of argon (1.33 × 10-1 Pa) mixed with various partial pressures of...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/19667748832722251190 |