Plasma oxidation and anodic oxidation of aluminum thin films

碩士 === 國立中興大學 === 材料工程學研究所 === 93 === Abstract In this study, Al thin films were oxidized by plasma oxidation and anodic oxidation. The Al films were deposited on polyethylene terephthalate (PET) and Si wafers by DC magnetron sputtering technique. The intensi...

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Bibliographic Details
Main Authors: Horng-Dar tsai, 蔡宏達
Other Authors: 呂福興
Format: Others
Language:zh-TW
Published: 2005
Online Access:http://ndltd.ncl.edu.tw/handle/90032933555828805925