The Investigation of Interface and Electrical Properties in GaAs Wafer Bonding

碩士 === 國立中興大學 === 材料工程學研究所 === 93 === Using high resolution transmission electron microscopy (HRTEM), we investigated the microstructure of the interface fabricated after twist-bonding(90° & 180°) two N-type and P-type GaAs wafers respectively at a series of annealing temperatures (500 ~ 850℃) a...

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Bibliographic Details
Main Authors: Ji Hao Cheng, 鄭季豪
Other Authors: Hao Ouyang
Format: Others
Language:zh-TW
Published: 2005
Online Access:http://ndltd.ncl.edu.tw/handle/72745092137673109756