Stripping of Cr and CrN thin films by electrochemical methods
碩士 === 國立中興大學 === 材料工程學研究所 === 93 === Abstract This research mainly employs electrochemical methods under alkaline condition to strip the chromium nitride (CrN) and chromium (Cr) thin films that were deposited by cathodic arc plasma technique on Si wafer. Different current density, concentration of...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2005
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/03215788121756015194 |