Fabrication of Low-Temperature Poly-Si Thin-Films Using Hot-Wire CVD and Al-induced Crystallization Techniques
碩士 === 國立中興大學 === 材料工程學研究所 === 93 === The study utilized hot-wire chemical vapor deposition (HWCVD) which mixed different ratio of SiH4 and H2 to deposit Si-film rapidly and also used aluminum-induced crystallization (AIC) to fabricate high-quality polycrystalline silicon (poly-Si) films which serve...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/99574835223515040275 |