Effect of Slurry Composition on the Electrochemical and Surface Characteristics of Cu and Ta in Chemical-Mechanical Polishing
博士 === 國立成功大學 === 材料科學及工程學系碩博士班 === 93 === Abstract This research was to investigate and explore how the slurry composition affects the removal rate and surface roughness of copper and tantalum. This accomplished research was through the analyses of the components of the surface composition, elec...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2005
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/55548138560518093985 |