Mechanism Discussion of Laser Assisted Imprinting Technology
碩士 === 國立成功大學 === 微機電系統工程研究所 === 93 === Recently semiconduction industry in order to achieve more and more small line width, result in mainly key technique constantly advancement for photolithography. Nanoimprint is a new technology which solves the foregoing circumstance. Subsequently, ways of var...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/64910640969535923247 |