The Application of Cobalt Silicide on Nano-scaled USLI Semiconductor Devices
博士 === 國立交通大學 === 材料科學與工程系所 === 93 === The scaling of the CMOS transistor has been the primary factor driving improvements in microprocessor performance. Transistor delay times have decreased by more than 30% per technology generation resulting in a doubling of microprocessor performance every two y...
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| Format: | Others |
| Language: | en_US |
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2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/42564529587350755867 |