Electrical Characteristics Study of Low Dielectric Constant Materials in Multilevel Interconnect System
博士 === 國立交通大學 === 電子工程系所 === 93 === This dissertation studies the electrical characteristics of low dielectric constant (low-k) materials in back end Cu interconnects of integrated circuits (ICs). It also discusses the possibility of applying low dielectric constant film in high frequency signal tra...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/56bsjd |