Investigation of Nitrided Oxides and High-k Dielectrics on MOS Devices and Flash Memories
博士 === 國立交通大學 === 電子工程系所 === 93 === For the system on a chip (SOC) application, a continuously scaling of the gate dielectrics for complementary metal oxide semiconductor (CMOS) and inter-poly dielectrics (IPDs) for electrically-erasable programmable read only memory (EEPROM) and stacked-gate flash...
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| Format: | Others |
| Language: | en_US |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/55226047375005904850 |